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Joseph Cecchi
Ph.D. ·
Albuquerque, New Mexico
Nuclear Engineering
Micro- and nano-fabrication for semiconductor devices and interconnects
Plasma etching and plasma etch tools (Parallel Plate, RIE, ECR, ICP, TCP, Helicon)
Plasma diagnostics: RF measurements, optical emission, laser induced fluorescence, diode laser absorption spectroscopy, microwave interferometry
Chemical Vapor Deposition (CVD) and Plasma-Enhanced CVD (PECVD)
Micro-Electro Mechanical Systems (MEMS)
Chemical-Mechanical Planarization (CMP)
Atomic Layer Deposition (ALD) and Plasma-Assisted ALD (PA-ALD)
Molecular beam electric resonance measurements of rotational magnetic moments and hyperfine structure of diatomic molecules
Plasma physics, Plasma Transport, Plasma-materials interactions
Vacuum ultraviolet spectroscopy
Beam foil spectroscopy/vacuum ultraviolet spectroscopy of highly stripped atoms
Interaction of hydrogen and deuterium with Zr-alloy bulk getter
Polarization of atomic hydrogen by optical pumping and spin exchange
Plasma-excited supersonic atom sources (Ar, He) for metastable and reactive beam generation
Chemical Engineering
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