Joseph Cecchi

Ph.D. ·

Albuquerque, New Mexico

Nuclear Engineering

Micro- and nano-fabrication for semiconductor devices and interconnects

Plasma etching and plasma etch tools (Parallel Plate, RIE, ECR, ICP, TCP, Helicon)

Plasma diagnostics: RF measurements, optical emission, laser induced fluorescence, diode laser absorption spectroscopy, microwave interferometry

Chemical Vapor Deposition (CVD) and Plasma-Enhanced CVD (PECVD)

Micro-Electro Mechanical Systems (MEMS)

Chemical-Mechanical Planarization (CMP)

Atomic Layer Deposition (ALD) and Plasma-Assisted ALD (PA-ALD)

Molecular beam electric resonance measurements of rotational magnetic moments and hyperfine structure of diatomic molecules

Plasma physics, Plasma Transport, Plasma-materials interactions

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Vacuum ultraviolet spectroscopy

Beam foil spectroscopy/vacuum ultraviolet spectroscopy of highly stripped atoms

Interaction of hydrogen and deuterium with Zr-alloy bulk getter

Polarization of atomic hydrogen by optical pumping and spin exchange

Plasma-excited supersonic atom sources (Ar, He) for metastable and reactive beam generation

Chemical Engineering

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